China Becomes the 2nd Largest Patent Layout Target Market

December 28, 2017

In the recent 2016 Global Patent Innovation Activities Research Report, China became the runner-up of patent layout target markets immediately after US. And Japan and US demonstrate high interest in Chinese market as the invention patents granted in China from these two countries accounted for nearly 1/5 of the total volume in China.


The report conducted a systematic scan, from 2008 to 2015, of the patent innovation activities that took place around the world, and compared the activities for research and analysis. It’s reported that, from 2008 to 2015, the published invention patents and granted patents in China had grown by 20.97% and 22.48% respectively. The strong growth in technology innovation of China also helped push the growth of global patent technology innovation.


It’s shown that from 2012 to 2015, among the 31 technical fields classified by WIPO, China tops the volume of granted invention patents in 13 fields including measurements, organic fine chemical etc.


The report also mentions the challenges in front of China for patent technology innovation such as the misalignment of patent quantity and quality, imbalance of development in different fields.